Micromachining excimer gas
Micromachining excimer gas
Micromachining excimer gas
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Micromachining excimer laser premixed gas
The upgrading of industrial technology needs to balance the contradiction between increasing performance requirements and processing speed and manufacturing costs. The birth of excimer lasers, known as their high photon energy, is once again at the forefront of cutting-edge industrial laser solutions in an era of increasing demand for breakthrough materials. As the representative of the most effective and reliable pulsed UV laser technology today, excimer lasers have effectively advanced such as semiconductor, AMOLED flat panel display, thin film, silicon substrate processing, organometallic precipitation, high temperature superconductivity, etching, material research, automotive Technological innovations in a variety of growing industries such as manufacturing, biomedical, fiber optics, diamond marking equipment and alternative energy. Excimer laser gas is the key gas for laser generators in excimer laser equipment
Advantages of PUREGAS excimer laser premixed gas:
Use the highest level of purity of the raw material gas
Precisely formulated with an automated gas premix system to effectively reduce the effects of human factors
Packaging cylinders use a unique passivation technology to effectively ensure the proportion of trace reactive gases to ensure reliable stability
Provide professional integrated services, including laser equipment repair services!
Common excimer laser gases are wavelength dependent:
Available wavelength | 193 nm | ArF |
248 nm | KrF | |
308 nm | XeCl | |
450nm~520nm | XeF |
The specific ratios are related to the make and model of the package and excimer laser equipment:
Brand | Model | Wave length | Excimer laser gas |
ATL | ATL ARF-1 | 193 nm | F2,Ar,Xe,Ne |
ATL KRF-1 | 248 nm | F2,Kr,Xe,Ne | |
TUI | CTFTS-ARFV 2.2 | 193 nm | F2,Ar,He,Ne |
CTFTS-KRFV 2.1 | 248 nm | F2,Kr,He,Ne | |
CTFTS-KRFV 2.2 | 248 nm | F2,Kr,He,Xe,Ne | |
CTMD-ARFV 2.0 | 193 nm | F2,Ar,He,O2,Ne | |
CTMD-XECLV 2.1 | 308 nm | HCl,H2,Xe,Ne | |
CTMN-ARFV 2.0 | 193 nm | F2,Ar,He,Ne | |
CTMN-ARFV 2.1 | 193 nm | F2,Ar,He,Ne | |
CTMN-KRFV 1.0 | 248 nm | F2,Kr,He,Ne | |
CTMN-KRFV 2.0 | 248 nm | F2,Kr,He,Ne | |
CTMN-XECLV 2.0 | 308 nm | HCl,H2,Xe,Ne | |
CTMN-XECLV 5.0 | 308 nm | HCl,H2,Xe,Ne | |
CTMN-XEFV 1.1 | 450nm~520nm | F2,Xe,He,Ne | |
CTMN-XEFV 1.2 | 450nm~520nm | F2,Xe,He,Ne | |
GAM Laser | EX5 ArF | 193 nm | F2,Ar,He,O2,Ne |
EX5 KrF | 248 nm | F2,Kr,He,Ne | |
EX5 XeCl | 308 nm | HCl,H2,Xe,Ne | |
EX10 | 193 nm | F2,Ar,He,Ne | |
EX50 | 193 nm | F2,Ar,He,Ne | |
EX100 | 193 nm | F2,Ar,He,Ne | |
Photomedex | XeCl | 308 nm | HCl,Xe,Ne |
Photoscribe | ArF | 193 nm | F2,Ar,Ne |
KrF | 248 nm | F2,Kr,Ne | |
PotomacPhotonics | ArF | 193 nm | F2,Ar,Ne |
KrF | 248 nm | F2,Kr,Ne | |
Spectranetics | XeCl | 308 nm | HCl,H2,Xe,Ne |
