The relative molecular weight is 88.00. At room temperature, carbon tetrafluoride is a colorless, odorless, non-combustible, compressible gas with high volatility. It is one of the most stable organic compounds and is not easily soluble in water. At 900 ° C, does not react with copper, nickel, tungsten, molybdenum, only slowly decomposes at carbon arc temperature, slightly soluble in water, its solubility is 0.0015% (weight ratio) at 25 ° C and 0.1Mpa, but with flammable When a gas burns, it will decompose to produce toxic fluoride.

Application areas:

Carbon tetrafluoride is the most widely used plasma etching gas in the microelectronics industry. Its high purity gas and carbon tetrafluoride high purity gas with high purity oxygen can be widely used in silicon, silicon dioxide and silicon nitride. Etching of phosphorous silicon glass and tungsten thin film materials. For silicon and silicon dioxide systems, when using CF4-H2 reactive ion etching, by adjusting the ratio of the two gases, a 45:1 selectivity can be obtained, which is very good when etching the silicon dioxide film on the polysilicon gate. it works.

It is also widely used in surface cleaning of electronic devices, production of solar cells, laser technology, gas phase insulation, low temperature refrigeration, leak test agents, control of the attitude of space rockets, and detergents in the production of printed circuits.

Due to its strong chemical stability, CF4 can also be used in the metal smelting and plastics industries.